Microstructure and Mechanical Properties of Co-Deposited Ti-Ni Films Prepared by Magnetron Sputtering

Mechanical Properties and Microstructural Evolution of Ta/TaNx Double Layer Thin Films Deposited by Magnetron Sputtering

Crystalline tantalum thin films of about 500nm thickness were deposited on AISI 316L stainless steel substrate using magnetron sputtering. To investigate the nano-mechanical properties of tantalum films, deposition was performed at two temperatures (25°C and 200°C) on TaNx intermediate layer with different N2/Ar flow rate ratio from 0 to 30%. Nano-indentation was performed to obtain the mechani...

Influence of aging temperature on phase transformation and mechanical behavior of NiTi thin films deposited by magnetron sputtering technique

In this study, NiTi thin films were deposited on the glass and NaCl substrates by means of magnetron sputtering method. The influence of aging temperature, over the range 300-500 oC, on phase transformation and mechanical properties of the sputtered NiTi thin films were studied by differential scanning calorimetry (DSC) and nano-indentation assay, respectively. The DSC curves showed that the ag...

Characterization of Poly-Si Thin Films Deposited by Magnetron Sputtering onto Ni Prelayers

CrNx Films Prepared by DC Magnetron Sputtering and High-Power Pulsed Magnetron Sputtering: A Comparative Study

CrNx (0 ≤ x ≤ 0.91) films synthesized using highpower pulsed magnetron sputtering, also known as high-power impulse magnetron sputtering (HiPIMS), have been compared with those made by conventional direct-current (dc) magnetron sputtering (DCMS) operated at the same average power. The HiPIMS deposition rate relative to the DCMS rate was found to decrease linearly with increasing emission streng...

AlNXOY THIN FILMS DEPOSITED BY DC REACTIVE MAGNETRON SPUTTERING

AlNxOy thin films were produced by DC reactive magnetron sputtering, using an atmosphere of argon and a reactive gas mixture of nitrogen and oxygen, for a wide range of partial pressures of reactive gas. During the deposition, the discharge current was kept constant and the discharge parameters were monitored. The deposition rate, chemical composition, morphology, structure and electrical resis...